Availability
Published
Product Code
IPR-1110-801
Release Date
Product Item Code
CMO-CMV4000-2E12M1PP_
Device Manufacturer
CMOSIS
Device Type
CMOS Image Sensor
CMOSIS CMV4000 Global Shutter CMOS Image Sensor Imager Process Review
This is an imager process review of the CMOSIS CMV4000. This report provides a thorough cross-sectional analysis of the general logic and pixel to help understand how the sensor is fabricated. The focus is on the elements specific to image sensors such as microlenses, color filters, pixel architecture, and photocathode. Analysis of the pixel is parallel and perpendicular to the column outline, to show the structure of the pixel array elements. Detailed images focus on the aperture, transistor gate structure, anti-reflective coatings, and photocathode. The cross-sectional analysis includes TEM imaging to highlight the gate oxide thicknesses, transistor gate structure, and back-end processing in the pixel array. SCM and SRP analyses of the doping profiles in the pixel array are included. And finally, the Imager Process Review includes a schematic of the unit pixels, or shared pixels if applicable. A plan-view analysis shows the pixel layout from the microlens level, through the metal and poly levels, and the silicon surface to show the diffusions.
 

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