This report contains the following detailed information:
- Selected teardown photographs, package photographs, package X-rays, die markings, and die photographs
- Scanning electron microscopy (SEM) cross-sectional micrographs across the memory array showing the general structure of the flash cell array, die dielectric materials, metal interconnects, major features, and transistors
- Measurements of vertical and horizontal dimensions of major microstructural features
- Plan-view optical micrograph of the die delayered to diffusion layer
- Identification of major functional blocks on a diffusion layer die photograph
- Table of functional block sizes and percentage die utilization
- High-resolution top metal and diffusion level die photographs delivered in the CircuitVision software
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